发明名称 MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
摘要 A monomer (1) is prepared by reacting a compound (9) with a base or metal to form a metal enolate reagent, and reacting the metal enolate reagent with an acyloxyketone compound (8). A polymer derived from the monomer is used as base resin to formulate a resist composition, which is shelf stable and displays a high dissolution contrast, controlled acid diffusion and low roughness in forming positive pattern via alkaline development and in forming negative pattern via organic solvent development.;
申请公布号 US2015322027(A1) 申请公布日期 2015.11.12
申请号 US201514689392 申请日期 2015.04.17
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 Fujiwara Takayuki;Sagehashi Masayoshi;Hasegawa Koji;Taniguchi Ryosuke
分类号 C07D307/33;C07D407/12;C07D307/94 主分类号 C07D307/33
代理机构 代理人
主权项 1. A method for preparing a monomer having the general formula (1), comprising the steps of reacting a compound having the general formula (9) with a base or a metal selected from Group 1A, 2A and 2B metals to form a metal enolate reagent, and reacting the metal enolate reagent with an acyloxyketone compound having the general formula (8): wherein R1 is hydrogen, methyl or trifluoromethyl, R2 is hydrogen or a straight, branched or cyclic C1-C10 monovalent hydrocarbon group which may contain a heteroatom,R3 and R4 are each independently hydrogen or a straight, branched or cyclic C1-C10 monovalent hydrocarbon group which may contain a heteroatom, R3 and R4 may bond together to form a ring with the carbon atom to which they are attached,R5 and R6 are each independently hydrogen or a straight, branched or cyclic C1-C10 monovalent hydrocarbon group which may contain a heteroatom, R5 and R6 may bond together to form a ring with the carbon atom to which they are attached,R7 and R8 are each independently hydrogen or a straight, branched or cyclic C1-C10 monovalent hydrocarbon group which may contain a heteroatom, R7 and R8 may bond together to form a ring with the carbon atom to which they are attached,X1 is a C1-C10 alkylene group which may have an ether, ester, lactone ring or hydroxyl, or a C6-C10 arylene group,m is 0 or 1, in case of m=0, R2 may bond with R5 or R6 to form a ring with the carbon atoms to which they are attached, in case of m=1, R2 may bond with R7 or R8 to form a ring with the carbon atoms to which they are attached,k1 is 0 or 1,Xc is hydrogen or halogen, andRa is a straight or branched C1-C10 monovalent hydrocarbon group.
地址 Tokyo JP