| 摘要 |
Disclosed is a scrubber for processing waste gas, capable of removing harmful materials from the waste gas generated in semiconductor and LCD processes. According to one aspect of the present invention, provided is the scrubber for processing the waste gas which includes a burner part which includes a burning chamber and a burner and pyrolyzes the waste gas by burning the waste gas generated in the semiconductor process, a water processing unit which includes a spray nozzle and sprays cooling water to the waste gas via the burner part, and a dehumidifying unit which dehumidifies water included in the waste gas by cooling the waste gas via the water processing unit at a temperature of the dew point or less. |
