发明名称 LASER LIFT-OFF APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a simply structured laser lift-off apparatus in which damage of a projection lens is prevented even when lift-off processing is applied to a small workpiece, for example when a laser lift-off process is performed after a cutting process.SOLUTION: A support substrate S2 laminated with individual chip-like workpieces W comprised of a sapphire substrate S1 and a material layer M is mounted on a work stage 4. Laser light from a laser source 1 passes through a mask 21 and is irradiated onto the individual workpieces by a projection lens 2. A projection pattern I is larger than the size of a chip-like workpiece W, and lift-off of one chip-like workpiece W is completed by one pulse. The sapphire substrate S1 flying out from the chip-like workpieces during lift-off collides with a protection member 7 disposed in the emission side of the projection lens 2; thus the projection lens 2 is protected.
申请公布号 JP2015199093(A) 申请公布日期 2015.11.12
申请号 JP20140079350 申请日期 2014.04.08
申请人 USHIO INC 发明人 NARUMI KEIJI
分类号 B23K26/57;B23K26/00;B23K26/70;H01L21/302;H01L33/00;H01S5/00 主分类号 B23K26/57
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