HIGH QUALITY SAPPHIRE SUBSTRATES AND METHOD OF MAKING SAID SAPPHIRE SUBSTRATES

摘要

Sapphire substrates suitable for semiconductor manufacturing characterized by a superior dimensional and shape qualities. The sapphire substrates are specifically characterized by having a very low local and gobal flatness (SFQR and GFLR) and a low roll-off amount (ROA). A time efficient method of making sapphire substrates having a very low SFQR, GFLR and ROA.