AUTOMATIC CALIBRATION SAMPLE SELECTION FOR DIE-TO-DATABASE PHOTOMASK INSPECTION

摘要

A method for selecting samples of reticle design data patterns in order to calibrate the parameters based on which the reference image used in a die-to-database reticle inspection method is rendered, the method comprising the steps of applying local binary pattern (LBP) analysis to a plurality of samples to obtain a p-dimensional vector output for each of the plurality of samples, clustering the q-D data points to M groups, selecting one sample from each clustered group, calculating evaluation scores for the samples selected, and, selecting a portion of the M samples on the representativeness score and the diversity score.

主权项

1. A method for selecting samples of reticle design data patterns in order to calibrate the parameters based on which the reference image used in a die-to-database reticle inspection method is rendered, the method comprising the steps of:
applying local binary pattern (LBP) analysis to a plurality of design data samples to obtain a p-dimensional vector output for each of the plurality of samples; clustering the set of vector output data points into M number of groups; selecting one sample from each clustered group; calculating evaluation scores for the samples selected; and, selecting a portion of the M samples on the representativeness score and the diversity score.