| 摘要 |
PROBLEM TO BE SOLVED: To purify (remove particles in) a processing liquid for performing a liquid processing on a substrate without deteriorating the processing liquid.SOLUTION: The present invention relates to a substrate liquid processing apparatus (1) and substrate liquid processing method for performing a liquid processing on a substrate (3) using a processing liquid, and a computer-readable recording medium (12) with a substrate liquid processing program recorded therein. In the substrate liquid processing method, a first chemical liquid supply step (S1, S6, S12) is performed to supply a first chemical liquid from a first chemical liquid supply unit (17) to a processing liquid storage unit (14); then a first chemical liquid purifying step (S2, S7, S13) is performed to purify the first chemical liquid in a chemical liquid purifying unit (51); then a second chemical liquid supply step (S3, S8, S14) is performed to supply a second chemical liquid from a second chemical liquid supply unit (18) to the processing liquid storage unit (14); and then a processing liquid supply step (S5, S11, S7) is performed to supply the processing liquid obtained by mixing the first and second chemical liquids from the processing liquid supply unit (38) to a substrate liquid processing unit (10). |
