| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning fluid for a lithography having an excellent corrosion suppression function on metal of at least one kind selected from the group consisting of tungsten, cobalt, copper, and alloy consisting of any of these metals, and also to an etching working method for a substrate using this cleaning fluid for the lithography.SOLUTION: A cleaning fluid for a lithography includes: a basic compound; a water-soluble organic solvent; water; and a polyvalent mercaptan compound whose Log P is 0.5 or less. Preferably, the cleaning fluid for the lithography includes a metal region composed of metal of at least one kind selected the group consisting of tungsten, cobalt, copper, and alloy consisting of any of these metals, and at least a part of this metal region is used for cleaning of a substrate exposed to the surface. |
