| 发明名称 |
Projection System and Mirror and Radiation Source for a Lithographic Apparatus |
| 摘要 |
Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror (510) having an actuator (500) for positioning the mirror and/or configuring the shape of the mirror, the actuator also providing active damping to the mirror, and a controller (515a, 515b) for generating actuator control signals for control of said actuator(s). A first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said actuator(s) when providing active damping to said mirror. |
| 申请公布号 |
US2015323872(A1) |
申请公布日期 |
2015.11.12 |
| 申请号 |
US201314762190 |
申请日期 |
2013.12.12 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DE KERKHOF Marcus Adrianus;VAN OOSTEN Anton Bernhard;BUTLER Hans;LOOPSTRA Erik Roelof;VAN DER WIJST Marc Wilhelmus Maria;ZAAL Koen Jacobus Johannes Maria |
| 分类号 |
G03F7/20;G02B7/182 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A projection system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus, said projection system comprising:
at least one mirror comprising at least one actuator that is operable to position said mirror and/or configure the shape of said mirror; and to provide active damping to said mirror; at least one controller for generating actuator control signals for control of said at least one actuator; wherein a first coordinate system is used for control of said actuator(s) when positioning said mirror and/or configuring the shape of said mirror and a second coordinate system is used for control of said at least one actuator when providing active damping to said mirror. |
| 地址 |
Veldhoven NL |
