| 摘要 |
The present invention relates to a liquid precursor supply apparatus which enables a thin film deposition process at a low temperature during the manufacture of a semiconductor device and a display device. To this end, the present invention comprises: an aerosol generator for converting a liquid precursor stored inside thereof into an aerosol state by using ultrasonic vibration; a vaporizer in which a heater block having a plurality of diagonal plate-structured heaters alternately arranged in a zigzag manner are installed such that the aerosol-state precursor delivered from the aerosol generator collides to obtain thermal energy and changes into a gaseous state; and a precursor storage means for storing, at a certain pressure and temperature, the precursor changed into a gaseous state by the vaporizer, and for supplying the precursor in a gaseous state to a chamber during a thin film deposition process. |
