METHOD OF PRODUCING STRUCTURE CONTAINING PHASE SEPARATION STRUCTURE AND METHOD OF FORMING TOP COAT FILM

摘要

PROBLEM TO BE SOLVED: To provide a method of producing a structure containing a phase separation structure and a method of forming a top coat film.SOLUTION: A method of producing a structure containing a phase separation structure includes a step of forming a layer 2 containing a block copolymer on a substrate 1, a step of applying a top coat material onto the layer 2 containing the block copolymer to form a top coat film 3 and a step of subjecting the layer 2 which is provided with the top coat film 3 and contains the block copolymer to a phase separation by thermal annealing. The top coat material comprises a polymer compound containing a dicarboxylic acid or a salt of a dicarboxylic acid and an organic solvent ingredient (S), and the organic solvent ingredient(S) contains water and a 3C or higher alcohol.