发明名称 |
Rectifier Structures with Low Leakage |
摘要 |
An integrated circuit device includes a first III-V compound layer, a second III-V compound layer over the first III-V compound layer, a gate dielectric over the second III-V compound layer, and a gate electrode over the gate dielectric. An anode electrode and a cathode electrode are formed on opposite sides of the gate electrode. The anode electrode is electrically connected to the gate electrode. The anode electrode, the cathode electrode, and the gate electrode form portions of a rectifier. |
申请公布号 |
US2015325679(A1) |
申请公布日期 |
2015.11.12 |
申请号 |
US201514790588 |
申请日期 |
2015.07.02 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Wong King-Yuen;Yu Chen-Ju;Yu Jiun-Lei Jerry;Chen Po-Chih;Yao Fu-Wei;Yang Fu-Chih |
分类号 |
H01L29/66;H01L21/311;H01L21/28;H01L21/308;H01L29/423;H01L29/40;H01L21/265;H01L21/306 |
主分类号 |
H01L29/66 |
代理机构 |
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代理人 |
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主权项 |
1. A method comprising:
implanting a first portion of a second III-V compound layer with negatively charged ions, wherein the second III-V compound layer is over a first III-V compound layer, and the first III-V compound layer has a first bandgap different from a second bandgap of the second III-V compound layer, and wherein the second III-V compound layer comprises a second portion and a third portion on opposite sides of the first portion; forming a first electrode electrically connected to the second portion of the second III-V compound layer; forming a second electrode electrically connected to the third portion of the second III-V compound layer; forming a gate dielectric over the first portion of the second III-V compound layer; and forming a gate electrode over the gate dielectric. |
地址 |
Hsin-Chu TW |