| 摘要 |
An attachment surface of a processed substrate, peeled from a support substrate, is properly or efficiently cleaned. To achieve the purpose, a first cleaning device (151), cleaning an attachment surface of a processed substrate (W), includes a possession support part (310) possessing and supporting the processed substrate (W); a rotating tool (320) rotating the possession support part (310); a solvent nozzle (353) supplying a solvent of a protector to the attachment surface of the processed substrate (W); and an absorbing nozzle (360) absorbing and removing a peeler from the attachment surface of the processed substrate (W). The first cleaning device (151) cleans the attachment surface of the processed substrate (W) by rotating the processed substrate (W) with the rotating tool (320) while supplying the solvent of the protector from the solvent nozzle (353) to the attachment surface of the processed substrate (W). |
