发明名称 |
METAL OR SEMICONDUCTOR MELT REFINEMENT METHOD, AND VACUUM REFINEMENT DEVICE |
摘要 |
<p>An objective of the present invention is, in refining a metal or a semiconductor melt, without impairing refining efficiency, to alleviate wear and tear commensurate with unevenness in a crucible caused by instability in melt flow, and to allow safe operation over long periods of time such that leakages from the crucible do not occur. Provided is a metal or semiconductor melt refining method, in which, by using an AC resistance heating heater as a crucible heating method, the melt is heat retained and mixed by a rotating magnetic field which is generated by the resistance heating heater. The metal or semiconductor melt refinement method and a vacuum refinement device which is optimal for the refinement method are characterized in that, in order that a fluid instability does not occur in the boundary between the melt and the bottom face of the crucible when the melt is rotated by the rotating magnetic field, with a kinematic viscosity coefficient of the melt designated v (m 2 /sec), the radius of the fluid surface of the melt designated R (m), and the rotational angular velocity of the melt designated © (rad/sec), the operation is carried out such that the value of a Reynolds number (Re) which is defined as Re=R×(©/v)^(1/2) does not exceed 600.</p> |
申请公布号 |
EP2813471(A4) |
申请公布日期 |
2015.11.11 |
申请号 |
EP20120867738 |
申请日期 |
2012.02.06 |
申请人 |
SILICIO FERROSOLAR, S.L.U. |
发明人 |
KISHIDA, YUTAKA;DOHNOMAE, HITOSHI;KONDO, JIRO;GOTO, KIYOSHI;OHASHI, WATARU |
分类号 |
C01B33/037;B01D1/02;C22B9/02;C22B9/04;F27B14/04;F27B14/06;F27B14/14;F27D99/00 |
主分类号 |
C01B33/037 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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