| 摘要 |
Disclosed herein is a method of curing a color filter for an electronic display using an electron beam at low temperature. A conventional method of curing the color filter by thermal-heating is not suitable for a process of fabricating next generation flexible displays. In the method of the invention, after a color resist pattern is formed on a substrate, the resist is cured by an electron beam at 100° C. or less. Hence, the method can minimize damage of the substrate while facilitating dimension control of the color pattern and achieving precision of a fine pattern. A method of fabricating a color filter for an electronic display using the method is also disclosed. |
