| 摘要 |
<p>Disclosed is a conductive laminated body, and a method for preparing the same, wherein the conductive laminated body including: a substrate; a zinc oxide-based thin film doped with an element M; and an interlayer including an oxide M′2O3, which is interposed between the substrate and the zinc oxide-based thin film. The disclosed conductive laminated body includes a metal oxide interlayer of an oxidation number +3, between a substrate and a zinc oxide layer. Therefore, it is possible to improve electrical properties of a transparent conductive thin film, especially, a resistivity property, and to minimize the unevenness in electrical properties between a middle portion and a circumferential portion on the surface of the thin film in sputtering deposition. Also, in deposition of a zinc oxide film, in addition to inert gas such as argon gas, the use of hydrogen gas can improve the concentration of electrons, and herein, the interposition of an interlayer including a metal oxide, between the substrate and the zinc oxide-based transparent conductive film, allows the heat-resistance/moisture-resistance stability and the uniformity of electrical properties.</p> |
