发明名称 Light emitting diode and light emitting diode lamp
摘要 A light emitting diode is provided by the present invention which includes a pn junction-type light emitting unit having a light emitting layer (10) composed of n layers of a strained light emitting layer (12) and n−1 layers of a barrier layer (13), wherein when a barrier layer exists, the light emitting layer (10) has a structure in which one strained light emitting layer (12) and one barrier layer (13) are laminated alternately, n represents an integer of 1 to 7, and the thickness of the light emitting layer (10) is not more than 250 nm.
申请公布号 US9184345(B2) 申请公布日期 2015.11.10
申请号 US201113809294 申请日期 2011.07.08
申请人 SHOWA DENKO K.K 发明人 Seo Noriyoshi;Matsumura Atsushi;Takeuchi Ryouichi
分类号 H01L33/30;H01L33/06;A01G9/26;H01L33/12;H01L33/40 主分类号 H01L33/30
代理机构 Sughrue Mion, PLLC 代理人 Sughrue Mion, PLLC
主权项 1. A light emitting diode comprising a pn junction-type light emitting unit having a light emitting layer composed of n layers of a strained light emitting layer and n−1 layers of a barrier layer, wherein when a barrier layer exists, the light emitting layer has a structure in which one strained light emitting layer and one barrier layer are laminated alternately, n represents an integer of 1 to 7, and a thickness of the light emitting layer is not more than 250 nm, a composition formula of the strained light emitting layer is (AlXGa1-X)YIn1-YP(wherein 0≦X≦0.1 and 0.37≦Y≦0.46); the light emitting diode further comprises a compound semiconductor layer comprising at least the light emitting unit and a strain adjustment layer laminated on the light emitting unit, and a functional substrate bonded to a surface of the strain adjustment layer: and wherein: the strain adjustment layer has a lattice constant that is smaller than a lattice constant of the strained light emitting layer and a lattice constant of GaAs, when a barrier layer exists, the lattice constant of the strain adjustment layer is smaller than a lattice constant of the barrier layer, and the strain adjustment layer has a thickness within a range of 0.5 to 20 μm.
地址 Tokyo JP