Lithographic apparatus and device manufacturing method

摘要

Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.

主权项

1. A lithographic apparatus, comprising:
a movable table; a projection system configured to project the patterned beam onto a target portion of a substrate; a liquid supply system configured to at least partly fill a space between the projection system and the movable table with a liquid; a member that is located above the movable table and that extends along at least a part of the boundary of the space between the projection system and the movable table, the member configured to at least partly confine the liquid in the space; and a gas outflow port separate from the body of the member and configured to exhaust a flow of gas that at least partly confines humid gas in a volume around and in contact with the liquid in the space.