发明名称 DEVICE FOR LIQUID EXPOSURE TO CLEANING
摘要 FIELD: machine building.SUBSTANCE: device (1) contains assembly out of first container (10) and second container (20) for the liquid location and retaining. In the first container (10) the devices (11) for liquid cleaning by UV radiation are installed, and second container (20) is made with possibility to locate the liquid flowing from the first container (10). Between the first container (10) and second container (20) there is channel (15) for liquid. Besides the device contains closing/opening devices (16) connected with channel (15) for liquid between the first container (10) and second container (20), and made with possibility of transfer to different states, including state when the channel (15) for liquid is closed, and state when the channel (15) for liquid is opened. At that the opening/closing devices (16) are located in the bottom part of the first container (10).EFFECT: assurance of possibility of effective treatment of large quantities of liquid.14 cl, 12 dwg
申请公布号 RU2567152(C2) 申请公布日期 2015.11.10
申请号 RU20120122701 申请日期 2010.10.25
申请人 KONINKLEJKE FILIPS EHLEKTRONIKS N.V. 发明人 DARVINKEL GERT-JAN;PAVAR NARENDRA NIKANTKH
分类号 C02F1/32 主分类号 C02F1/32
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