| 摘要 |
The present invention relates to a substrate processing apparatus including a liquid supply unit and a substrate processing method using the substrate processing apparatus. According to an embodiment of the present invention, the substrate processing apparatus comprises: a first chamber which supplies a liquid to a substrate to process the substrate; a second chamber which supplies the liquid to the substrate to process the substrate; a liquid supply unit which supplies the liquid to the first chamber and the second chamber wherein the liquid supply unit includes a first tank which stores the liquid, and a second tank which receives the liquid from the first tank; a first liquid supply line provided with a first driving pump supplying the liquid stored in the first tank to the first chamber; a second liquid supply line provided with a second driving pump supplying the liquid stored in the second tank to the second chamber; a circulation line installed in the first tank, and provided with a circulation pump circulating the liquid in the first tank; a first branch line branched from the circulation line, supplying the liquid flowing along the circulation line to the second tank; and a second branch line branched from the first liquid supply line, supplying the liquid flowing in the first liquid supply line to the second tank. According to the present invention, it is possible to significantly shorten the liquid exchange time between the tanks of the liquid supply unit. |
