发明名称 薄膜トランジスタ素子とその製造方法、有機EL表示素子とその製造方法、および有機EL表示装置
摘要 <p>A thin film transistor element includes: a gate electrode; a source electrode and a drain electrode; an insulating layer; partition walls; and an organic semiconductor layer. The partition walls define a first aperture. Within the first aperture, at least a part of the source electrode and at least a part of the drain electrode are in contact with the semiconductor layer. The partition walls have side face portions facing the first aperture, and some of the side face portions have gentler slopes than the rest of the side face portions.</p>
申请公布号 JP5806309(B2) 申请公布日期 2015.11.10
申请号 JP20130521295 申请日期 2011.06.21
申请人 发明人
分类号 H01L21/336;H01L29/786;H01L51/50;H05B33/10;H05B33/22 主分类号 H01L21/336
代理机构 代理人
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