| 摘要 |
The method involves introducing a substrate e.g. glass sheet (2), in a reaction chamber (6) in which electrodes (1, 10) are placed. Voltage is generated to generate plasma (12) between the electrodes. An inductor is operated to reduce a phase shift between the voltage and current. Molecules (8) e.g. plasma contact, are introduced into the chamber. Voltage and/or frequency from a generator circuit and/or value of the inductor are adjusted to obtain optimal reaction characteristics. The substrate is maintained in the chamber during a period of time for surface preparation of substrate. An independent claim is also included for an installation for surface preparation of substrates, comprising a chamber. |
