Method for providing a template for a self-assemblable polymer for use in device lithography

摘要

Methods are disclosed for depositing a template for directed self-assembly of a self-assemblable block polymer on a surface of a substrate. The method involves providing a chemical epitaxy pattern of alternating first and second regions having differing chemical affinities for first and second blocks of the polymer on the surface by photolithography, and providing spaced graphoepitaxy features on the surface by photolithography. The chemical epitaxy pattern is aligned with and located between pairs of spaced graphoepitaxy features. The spaced graphoepitaxy features and chemical epitaxy pattern are arranged to act together to direct self-assembly of the self-assemblable block copolymer. The resulting template may be used to direct self-assembly of a suitable self-assemblable polymer and the resulting aligned and oriented self-assembled polymer may itself be used as a resist for lithography of the substrate.

主权项

1. A method of forming a template for directed self-assembly of a self-assemblable block polymer comprising first and second blocks on a surface of a substrate, the method comprising:
providing a chemical epitaxy pattern on the surface by photolithography, the chemical epitaxy pattern comprising alternating first and second regions having differing chemical affinities for the first and second blocks; and providing spaced graphoepitaxy features on the surface by photolithography, the chemical epitaxy pattern aligned with and located between pairs of spaced graphoepitaxy features, wherein the spaced graphoepitaxy features and chemical epitaxy pattern are arranged to act together to direct self-assembly of the self-assemblable block copolymer.