METHOD FOR PRODUCING SPATTERING TARGET OF MAGNETRON SOURCE FOR COATING DEPOSITION

摘要

FIELD: chemistry.SUBSTANCE: method for producing a spattering target of a magnetron source for coating application involves forming a recess in a metallic substrate by spattering a metallic substrate material in the magnetron source and filling the recess with a coating material. The recess in the metallic substrate is mechanically processed symmetrically from both sides, and its width is enlarged by 28?30% by removing the metallic substrate material along a recess profile.EFFECT: ensuring the required spattering quality of especially pure expensive materials by eliminating impurities of the chemical composition of the deposited coatings by means of the substrate material.1 dwg