| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithography apparatus capable of enhancing the throughput while reducing the cost, by using support means depending on the direction of movement of a stage, and the movement conditions for that direction.SOLUTION: A lithography apparatus includes a lenz barrel CL having an optical system for irradiating a substrate W with a beam, and a stage device repeating long distance movement of the substrate W in the main scanning direction, and short distance movement in the sub-scanning direction, and patterning the substrate W with a beam. The stage device has a first moving body YM moving in the main scanning direction, a floating unit LV which makes the first moving body YM movable in the main scanning direction while floating and supporting by magnetic force, a second moving body XM moving in the sub-scanning direction, and a linear guide XG which makes the second moving body XM movable in the sub-scanning direction while supporting in contact therewith. |
