发明名称 HOLE FORMATION METHOD AND MEASUREMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a hole formation method capable of opening a hole in a desired place of a thin film.SOLUTION: A first voltage is applied between two electrodes installed by sandwiching a film in the electrolytic solution while irradiating light to the film in an electrolytic solution 105 with respect to an insulating film 101 mounted with a near-field light emission element 203 or after providing the film in an electrolytic solution after irradiating light to the film, and after that, a second voltage is applied between the two electrodes, and a procedure of detecting a current value flowing between a first electrode and a second electrode by applying the second voltage is stopped when the current value reaches or exceeds a predetermined threshold value.
申请公布号 JP2015197385(A) 申请公布日期 2015.11.09
申请号 JP20140075880 申请日期 2014.04.02
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 ITABASHI NAOSHI;UTAKA SONOKO;YANAGI ITARU;AKABORI REINA;TAKEDA KENICHI
分类号 G01N27/00;B82Y40/00;G01N21/64;G01N21/65 主分类号 G01N27/00
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