发明名称 |
HOLE FORMATION METHOD AND MEASUREMENT DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a hole formation method capable of opening a hole in a desired place of a thin film.SOLUTION: A first voltage is applied between two electrodes installed by sandwiching a film in the electrolytic solution while irradiating light to the film in an electrolytic solution 105 with respect to an insulating film 101 mounted with a near-field light emission element 203 or after providing the film in an electrolytic solution after irradiating light to the film, and after that, a second voltage is applied between the two electrodes, and a procedure of detecting a current value flowing between a first electrode and a second electrode by applying the second voltage is stopped when the current value reaches or exceeds a predetermined threshold value. |
申请公布号 |
JP2015197385(A) |
申请公布日期 |
2015.11.09 |
申请号 |
JP20140075880 |
申请日期 |
2014.04.02 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
ITABASHI NAOSHI;UTAKA SONOKO;YANAGI ITARU;AKABORI REINA;TAKEDA KENICHI |
分类号 |
G01N27/00;B82Y40/00;G01N21/64;G01N21/65 |
主分类号 |
G01N27/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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