| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing composition which has a relatively high polishing speed for a polishing object with a relatively high hardness, such as a hard and brittle material substrate, and can maintain the polishing speed for a long time.SOLUTION: A polishing composition comprises water and silica, the silica having a BET specific surface area of 30 m/g or more and an NMR specific surface area of 10 m/g or more. |
