发明名称 RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER, AND COMPOUND
摘要 PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in LWR performance, CDU performance, resolution, rectangularity of a cross-sectional shape, depth of focus, exposure latitude, and MEEF performance.SOLUTION: The radiation-sensitive resin composition comprises a polymer having a first structural unit including a partial structure represented by formula (1) below, and a radiation-sensitive acid generator. In formula (1), a and b each independently represent an integer of 0 to 5, where a+b is 1 or more.
申请公布号 JP2015197612(A) 申请公布日期 2015.11.09
申请号 JP20140075851 申请日期 2014.04.01
申请人 JSR CORP 发明人 NAMAI HAYATO;SAITO RYUICHI
分类号 G03F7/038;C08F220/18;G03F7/004;G03F7/039;H01L21/027 主分类号 G03F7/038
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