| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing an active ray-sensitive or radiation-sensitive resin composition that has an extremely small amount of particles generated immediately after it is produced and has such excellent temporal stability that it is inhibited from the deposition of particles due to storage, for achieving the formation of an ultrafine pattern free from defects (for example, a line width of 50 nm or less), and to provide an active ray-sensitive or radiation-sensitive resin composition produced by the production method.SOLUTION: In the method for producing an active ray-sensitive or radiation-sensitive resin composition, the method includes a step of filtering an active ray-sensitive or radiation-sensitive resin composition by passing the active ray-sensitive or radiation-sensitive resin composition through a filter. The method further includes five times or more of steps of filtering using a first filter having a bore diameter of 10 nm or less. |
