| 摘要 |
The present invention relates to a cleaning device for a substrate for a camera module. The present invention comprises: a rotation plate rotated inside a chamber having a predetermined space while a plurality of substrates for a camera module are mounted; and a cleaning unit mounted in the rotation plate to inject an air and a cleaning solution to the rotating substrates and to clean the substrates. The inside of the chamber is formed in an asymmetrical structure around the rotation plate, any one side wall adjacent to the rotation plate is formed in a linear shape, and an exhaust hole is formed in an end of the chamber. Therefore, the cleaning solution and the air and foreign substances are smoothly discharged toward one side due to a centrifugal force in accordance with rotation of the rotation plate while the substrate for a camera module is cleaned in order to significantly improve cleaning efficiency. |
