| 发明名称 |
ELECTROLESS DEPOSITION OF CONTINUOUS NICKEL LAYER USING COMPLEXED TITANIUM (III) METAL CATIONS AS REDUCING AGENTS |
| 摘要 |
A solution for electroless deposition of nickel is provided. A reducing agent of Ti^3+ ions is provided to the solution. Ni^2+ ions are provided to the solution. |
| 申请公布号 |
KR20150124915(A) |
申请公布日期 |
2015.11.06 |
| 申请号 |
KR20150059769 |
申请日期 |
2015.04.28 |
| 申请人 |
LAM RESEARCH CORPORATION |
发明人 |
NORKUS EUGENIJUS;TAMASAUSKAITE TAMASIUNAITE LORETA;JOI ANIRUDDHA;JAGMINIENE ALDONA;STANKEVICIENE INA;DORDI YEZDI |
| 分类号 |
C23C18/16;C23C18/08;C23C18/31 |
主分类号 |
C23C18/16 |
| 代理机构 |
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代理人 |
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