发明名称 FERROELECTRIC MEMORY AND METHODS OF FORMING THE SAME
摘要 Ferroelectric memory and methods of forming the same are provided. An example memory cell can include a buried recessed access device (BRAD) formed in a substrate and a ferroelectric capacitor formed on the BRAD.
申请公布号 WO2015167887(A1) 申请公布日期 2015.11.05
申请号 WO2015US26994 申请日期 2015.04.22
申请人 MICRON TECHNOLOGY, INC. 发明人 CHAVAN, ASHONITA A.;CALDERONI, ALESSANDRO;RAMASWAMY, D.V. NIRMAL
分类号 H01L27/115;H01L27/108 主分类号 H01L27/115
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