| 摘要 |
<p>A hard surface cleaning composition comprising: a) from 1% to 60% by weight of the composition of a surfactant system; and b) from 0.1% to 10% by weight of the composition of a cleaning amine of Formula(I): wherein the radicals R1, R2, R3, R4 and R5 are independently selected from NH2, -H, linear or branched alkyl or alkenyl having from 1 to 10 carbon atoms and n is from 0 to 3 and wherein at least one of the radicals is NH2.</p> |
