| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure apparatus capable of obtaining high exposure precision and measurement precision by excellently forming a liquid immersion area.SOLUTION: An exposure apparatus EX exposes a substrate P by radiating exposure light EL on the substrate P through liquid LQ supplied from a liquid supply mechanism 10 and a projection optical system PL. The exposure apparatus EX comprises a pressure adjustment mechanism 90 for adjusting pressure of the liquid LQ supplied from the liquid supply mechanism 10. |
