| 摘要 |
PROBLEM TO BE SOLVED: To provide an effective polishing pad having translucent regions of constant light transmissivity over the lifetime of the polishing pad, and a polishing method and apparatus utilizing the polishing pad.SOLUTION: Provided is a polishing pad substrate for chemical mechanical polishing containing a porous material made of thermoplastic polyurethane having an average pore size of 0.01 microns to 1 micron. In the polishing pad substrate: light transmittance is 50% or more at at least one wavelength in the range from 200 nm to 35,000 nm; the porous material has a density of 0.5 g/cmor greater; and 90% or more of the pores in the porous material have a pore size distribution of ±0.2 μm or less. Also provided are a polishing pad comprising the polishing pad substrate, a polishing method including operations using the polishing pad substrate, and a chemical mechanical apparatus comprising the polishing pad substrate. |
