发明名称 ALUMINUM SUBSTRATE FOR A THIN FILM TRANSISTOR
摘要 A substrate comprises of a recrystallized aluminum alloy. An organic polymer layer coats the top surface of the aluminum substrate. A layer of one of: SiO2, SiN and Al2O3 is on the organic polymer and at least one electrode is adhered to the layer of one of: SiO2, SiN and Al2O3. A method comprises depositing an organic polymer on an aluminum substrate, annealing the aluminum substrate; depositing a layer of one of: SiO2, SiN and Al2O3 on the organic polymer; and adhering an electrode to the layer of one of: SiO2, SiN and Al2O3.
申请公布号 WO2015168425(A1) 申请公布日期 2015.11.05
申请号 WO2015US28549 申请日期 2015.04.30
申请人 ALCOA INC. 发明人 LEVENDUSKY, THOMAS L.;SHAH, KIRIT N.;GREGORY, MARCIA L.;VANBROOKHOVEN, JEFF S.;HATALIS, MILTIADIS K.
分类号 H01L29/786;H01L21/336 主分类号 H01L29/786
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