| 摘要 |
PROBLEM TO BE SOLVED: To provide a chemical treatment device which can highly accurately maintain the quality of an object to be treated after the object to be treated has been treated.SOLUTION: In an etching device 100 immersing a wafer cassette into an etchant in an etching bath to be treated, an etching time during which the wafer cassette is immersed into the etching bath is determined according to the degree of degradation of the etchant due to a precedent wafer cassette whose etching treatment is completed before the wafer cassette is subjected to etching treatment. |
