METHOD AND SYSTEM FOR OPTICAL CHARACTERIZATION OF PATTERNED SAMPLES

摘要

A method and system are presented for use in measuring on patterned samples, aimed at determining asymmetry in the pattern. A set of at least first and second measurements on a patterned region of a sample is performed, where each of the measurements comprises: directing illuminating light onto the patterned region along an illumination channel and collecting light reflected from the illuminated region propagating along a collection channel to be detected, such that detected light from the same patterned region has different polarization states which are different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement. Thus, at least first and second measured data pieces are generated for the at least first and second measurements on the same patterned region. The at least first and second measured data pieces are analyzed and output data is generated being indicative of a condition of asymmetry in the patterned region.

主权项

1. A method for use in measuring on patterned samples, the method comprising:
performing a set of at least first and second measurements on a patterned region of a sample, each of the measurements comprising: directing illuminating light onto said patterned region along an illumination channel and collecting light reflected from said region propagating along a collection channel to be detected, such that detected light has a polarization state different from polarization of the illuminating light, and generating a measured data piece indicative of the light detected in the measurement, thereby generating at least first and second data pieces for said at least first and second measurements on the same patterned region, where the at least first and second measured data pieces correspond to the detected light having different polarization states; and analyzing a set of said at least first and second measured data pieces and generating output data indicative of a condition of asymmetry in said patterned region.