ESTIMATING DEFORMATION OF A PATTERNING DEVICE AND/OR A CHANGE IN ITS POSITION
摘要
A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.
申请公布号
WO2015165623(A1)
申请公布日期
2015.11.05
申请号
WO2015EP54650
申请日期
2015.03.05
申请人
ASML NETHERLANDS B.V.;ASML HOLDING N.V.
发明人
MOEST, BEARRACH;DELMASTRO, PETER, A.;ONVLEE, JOHANNES;VAN DER WIELEN, ADRIANUS, MARTINUS;WARD, CHRISTOPHER, CHARLES