PELLICLE FRAME, PELLICLE AND MANUFACTURING METHOD THEREOF, EXPOSURE ORIGINAL PLATE AND MANUFACTURING METHOD THEREOF, EXPOSURE DEVICE, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

摘要

Provided is a pellicle frame which includes a frame main body comprising: a groove disposed on one end surface, of the frame main body, that is in the thickness direction and that is on the side which supports a pellicle film; and a through hole that penetrates between an outer circumferential surface and a wall surface of the groove disposed on the one end surface.