| 发明名称 |
PHOTOSENSITIVE RESIN MATERIAL AND RESIN FILM |
| 摘要 |
A photosensitive resin material of the invention is a photosensitive resin material used to form a permanent film including one or more selected from a novolac-type phenol resin, a phenol aralkyl resin, and a hydroxystyrene resin as an alkali-soluble resin (A) and a photosensitive diazoquinone compound as a photosensitizing agent (B), in which a content of iron with respect to all non-volatile components, which is measured through flameless atomic absorption spectroscopy, is equal to or more than 0.005 ppm and equal to or less than 80 ppm, and non-ionic iron is included as the iron. |
| 申请公布号 |
US2015316845(A1) |
申请公布日期 |
2015.11.05 |
| 申请号 |
US201514698904 |
申请日期 |
2015.04.29 |
| 申请人 |
SUMITOMO BAKELITE CO., LTD. |
发明人 |
TANAKA Yuma |
| 分类号 |
G03F7/004;G03F7/038 |
主分类号 |
G03F7/004 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A photosensitive resin material used to form a permanent film, comprising:
one or more selected from a novolac-type phenol resin, a phenol aralkyl resin, and a hydroxystyrene resin as an alkali-soluble resin (A); and a photosensitive diazoquinone compound as a photosensitizing agent (B), wherein a content of iron with respect to all non-volatile components, which is measured through flameless atomic absorption spectroscopy, is equal to or more than 0.005 ppm and equal to or less than 80 ppm, and non-ionic iron is included as the iron. |
| 地址 |
Tokyo JP |
