发明名称 METHOD FOR MANUFACTURING TUNGSTEN-BASED CAPACITOR ELEMENT
摘要 The present invention provides a method for manufacturing a capacitor element having a good LC characteristic. This capacitor element manufacturing method for forming a semiconductor layer and a conductive layer in sequence on a dielectric layer after a chemical conversion step for forming the dielectric layer in a surface layer part of an anode body obtained by molding and sintering powder having tungsten as a main component is characterized by comprising, before forming the dielectric layer, an etching step for removing a natural oxide film formed on surface layer parts of the outer surface and the pore inner surface of the anode body such that the thickness thereof falls within the range of 0.5-5.0 nm, and performing the chemical conversion step at a temperature of -4 to 18°C for 7 to 110 minutes after a predetermined voltage is reached.
申请公布号 WO2015166670(A1) 申请公布日期 2015.11.05
申请号 WO2015JP51327 申请日期 2015.01.20
申请人 SHOWA DENKO K. K. 发明人 NAITO KAZUMI;TAMURA KATSUTOSHI
分类号 H01G9/04;H01G9/00;H01G9/042;H01G9/052 主分类号 H01G9/04
代理机构 代理人
主权项
地址