Angular Scanning Using Angular Energy Filter

摘要

An ion implantation system and method is provided for varying an angle of incidence of a scanned ion beam relative to the workpiece concurrent with the scanned ion beam impacting the workpiece. The system has an ion source configured to form an ion beam and a mass analyzer configured to mass analyze the ion beam. An ion beam scanner is configured to scan the ion beam in a first direction, therein defining a scanned ion beam. A workpiece support is configured to support a workpiece thereon, and an angular implant apparatus is configured to vary an angle of incidence of the scanned ion beam relative to the workpiece. The angular implant apparatus comprises one or more of an angular energy filter and a mechanical apparatus operably coupled to the workpiece support, wherein a controller controls the angular implant apparatus, thus varying the angle of incidence of the scanned ion beam relative to the workpiece concurrent with the scanned ion beam impacting the workpiece.

主权项

1. An ion implantation system, comprising:
an ion source configured to form an ion beam; a mass analyzer configured to mass analyze the ion beam; an ion beam scanner configured to scan the ion beam along a first axis, therein defining a scanned ion beam; a workpiece support configured to support a workpiece thereon; an angular implant apparatus, wherein the angular implant apparatus is configured to vary an angle of incidence of the scanned ion beam relative to the workpiece along a second axis; and a controller configured to control the angular implant apparatus, wherein the controller is configured to vary the angle of incidence of the scanned ion beam relative to the workpiece concurrent with the scanned ion beam impacting the workpiece.