发明名称 |
PROCESS AND MATERIALS FOR MAKING CONTAINED LAYERS AND DEVICES MADE WITH SAME |
摘要 |
There is provided a process for forming a contained second layer over a first layer, including the steps:
forming the first layer including a fluorinated material and a photoinitiator, and having a first surface energy;treating the first layer with a priming layer including an aromatic amine compound;exposing the priming layer patternwise with activating radiation, resulting in exposed areas and unexposed areas;developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a patterned priming layer, wherein the patterned priming layer has a second surface energy that is higher than the first surface energy; andforming the second layer by liquid deposition on the patterned priming layer on the first layer. |
申请公布号 |
US2015318476(A1) |
申请公布日期 |
2015.11.05 |
申请号 |
US201314652304 |
申请日期 |
2013.12.09 |
申请人 |
E. I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
FENNIMORE Adam;KONDAKOV Denis;MACKARA Steve;SCHADT Frank |
分类号 |
H01L51/00;H01L51/56 |
主分类号 |
H01L51/00 |
代理机构 |
|
代理人 |
|
主权项 |
1. A process for forming a contained second layer over a first layer, said process comprising:
forming the first layer comprising a fluorinated material and a photoinitiator, said first layer having a first surface energy; treating the first layer with a priming layer consisting essentially of an aromatic amine compound; exposing the priming layer patternwise with activating radiation, resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a patterned priming layer thereon, wherein the patterned priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid deposition on the patterned priming layer on the first layer. |
地址 |
Wilmington DE US |