Array Substrate and Method for Manufacturing the Same, and Display Device

摘要

Embodiments of the invention disclose an array substrate and a method for manufacturing the same, and a display device. The method for manufacturing an array substrate comprising: forming a gate metal layer, wherein the gate metal layer comprises gate lines; film-forming an active layer and film-forming a signal line metal layer, wherein the signal line metal layer comprises data lines; and forming both a pattern of the active layer and a pattern of the signal line metal layer simultaneously using a half-tone mask process, wherein after film-forming the active layer and before film-forming the signal line metal layer, the method further comprising: hollowing out a first region of the active layer through a patterning process, wherein the first region is below the data lines in a display area, and the first region excludes portions of the active layer corresponding to overlapping regions of the data lines and the gate lines.

主权项

1. A method for manufacturing an array substrate comprising: a step of forming a gate metal layer, wherein the gate metal layer comprises gate lines; a step of film-forming an active layer and a step of film-forming a signal line metal layer, wherein the signal line metal layer comprises data lines; and a step of forming both a pattern of the active layer and a pattern of the signal line metal layer simultaneously using a half-tone mask process, wherein after the step of film-forming an active layer and before the step of film-forming a signal line metal layer, the method further comprises a step of:
hollowing out a first region of the active layer through a patterning process, wherein the first region is below the data lines in a display area, and the first region excludes portions of the active layer corresponding to overlapping regions of the data lines and the gate lines.