发明名称 |
METHOD FOR CLEANING THIN FILM FORMING DEVICE, METHOD FOR FORMING THIN FILM, AND THIN FILM FORMING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for cleaning a thin film forming device capable of reducing maintenance work and shortening downtime.SOLUTION: A method for cleaning a thin film forming device 1 comprises a heating step and a cleaning step. The heating step heats the inside of a reaction tube 2 to 800°C to 900°C. The cleaning step generates an active species containing an oxygen active species by supplying a cleaning gas containing an oxygen gas and a hydrogen gas into the reaction tube and heating the cleaning gas with the inside of the heated reaction tube maintained at 1.33 Pa to 2660 Pa, and removes a deposit attached to the inside of the thin film forming device 1 with the generated active species. |
申请公布号 |
JP2015195386(A) |
申请公布日期 |
2015.11.05 |
申请号 |
JP20150118314 |
申请日期 |
2015.06.11 |
申请人 |
TOKYO ELECTRON LTD |
发明人 |
KUBO KAZUMI;ENDO ATSUSHI;MIZUNAGA SATORU |
分类号 |
H01L21/31;C23C16/27;C23C16/44 |
主分类号 |
H01L21/31 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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