| 摘要 |
PROBLEM TO BE SOLVED: To provide a blank with a resist layer, which can achieve both of miniaturizing a predetermined pattern (such as a line, a space, and a hole) to be formed, and resolution of the pattern, a transfer mask and a mold for imprinting using the above blank, and methods for manufacturing the blank with a resist layer, the transfer mask, and the mold for imprinting.SOLUTION: A blank 10 with a resist layer includes a resist layer 7 formed on a substrate 1 and comprising a positive resist material, in which the resist layer 7 has a thickness of 200 nm or less, an unexposed part of the resist layer 7 shows a dissolution rate of 0.05 nm/sec or less with respect to an aqueous developing solution. A development acceleration layer 9, which serves to cause the aqueous developing solution to spread over at least an exposed part of the resist layer 7, is formed on the resist layer 7. A contact angle with water on a surface of the unexposed part of the resist layer may be 66° or more. |
