| 摘要 |
A substrate-processing device is provided with: a substrate rotation unit (11) for causing a substrate (3) to turn while the substrate (3) is held; a processing liquid feeding unit (13) for feeding a processing liquid to the substrate; and a substitution liquid feeding unit for feeding a substitution liquid, which is substituted for the processing liquid fed from the processing liquid feeding unit, to the substrate. When the substitution liquid feeding unit (14) is feeding the substitution liquid to the substrate, the processing liquid feeding unit (13) feeds the processing liquid to a position further on the outer periphery side of the substrate than the position at which the substitution liquid fed from the substitution liquid feed unit is fed onto the substrate, and a liquid film of the processing liquid is formed. The entirety of the surface of the substrate can be kept covered by a liquid film without increasing the amount of the substitution liquid consumed. |
