METHOD FOR CONTROLLING A PLASMA CHAMBER

摘要

An system and method for controlling a plasma chamber includes operably coupling an RF generator to the plasma chamber, the RF generator providing an RF signal to a chamber input of the plasma chamber; measuring a parameter at the chamber input; determining a rate of change based on the measured parameter; detecting an excessive rate of change condition comprising the rate of change exceeding a reference rate of change; detecting a repetitive change condition comprising a predetermined number of the excessive rate of change conditions in a predetermined time; upon detection of the repetitive change condition, decreasing a power of the RF signal provided to the chamber input.

主权项

1. A system for controlling a plasma chamber, the system comprising:
an RF generator operably coupled to a chamber input of the plasma chamber, the RF generator configured to provide an RF signal to the chamber input; a sensor component configured to measure a parameter at the chamber input; and a control unit configured to:
receive a sensor signal from the sensor component, the sensor signal indicative of the measured parameter;determine a rate of change based on the measured parameter;detect an excessive rate of change condition comprising the rate of change exceeding a reference rate of change;detect a repetitive change condition comprising a predetermined number of the excessive rate of change conditions in a predetermined time; andupon detection of the repetitive change condition, decrease a power of the RF signal provided to the chamber input.