| 发明名称 |
POLISHING COMPOSITION FOR EDGE ROLL-OFF IMPROVEMENT |
| 摘要 |
The invention provides a chemical-mechanical polishing composition including (a) an abrasive comprising wet-process silica particles, (b) a water-soluble polymer, (c) an oxidizing agent, (d) a chelating agent, (e) a pH-adjusting agent, and (f) an aqueous carrier, wherein the pH of the polishing composition is about 1 to about 7. The invention also provides a method of polishing a substrate, especially a nickel-phosphorus substrate, with the polishing composition. |
| 申请公布号 |
US2015315417(A1) |
申请公布日期 |
2015.11.05 |
| 申请号 |
US201414269622 |
申请日期 |
2014.05.05 |
| 申请人 |
Cabot Microelectronics Corporation |
发明人 |
LAU Hon Wu;White Michael |
| 分类号 |
C09G1/02;B24B37/04 |
主分类号 |
C09G1/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A chemical-mechanical polishing composition comprising:
(a) an abrasive comprising wet-process silica particles, (b) a water-soluble polymer, (c) an oxidizing agent, (d) a chelating agent, (e) a pH-adjusting agent, and (f) an aqueous carrier, wherein the pH of the polishing composition is about 1 to about 7. |
| 地址 |
Aurora IL US |
