PATTERN DRAWING DEVICE, PATTERN DRAWING METHOD, DEVICE MANUFACTURING METHOD, LASER LIGHT SOURCE DEVICE, BEAM SCANNING DEVICE, AND BEAM SCANNING METHOD

摘要

Provided is a pattern drawing device for drawing, by means of scanning spots of a laser beam, a predetermined pattern on an object to be irradiated, wherein the pattern drawing device comprises: a light source device (14) that emits the laser beam; a plurality of drawing units (U1-U6) that each have an optical lens system and an optical scanning member that scans the laser beam in order to generate the scanning spots by causing the laser beam to be incident, the plurality of drawing units being disposed such that the scanning spots scan different regions on the object to be irradiated; and a plurality of selection optical elements (50, 58, 66) that are arranged serially along an advancing direction of the laser beam from the light source device in order to switch whether the laser beam from the light source device will be caused to be incident in a drawing unit selected from among the plurality of drawing units.